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Description of the Related Art For example, if a thin film transistor (TFT) is to be manufactured by using a TFT forming process such as the liquid crystal display (LCD) process, a semiconductor thin film (which will be referred to as a "semiconductor layer" hereinafter) is formed on an insulating surface of a substrate such as a glass substrate by a CVD (Chemical Vapor Deposition) process, a sputtering process or a metal organic deposition process, and the semiconductor thin film is patterned by a photolithography process. The semiconductor thin film is preferably patterned by a so-called single-mask exposure process in which a photomask is used which has a pattern corresponding to a circuit to be formed. With this single-mask exposure process, however, if any defects such as defects of the photomask, contaminants attached to the photomask, or a pin hole occurs, the semiconductor thin film will be patterned by such a defective pattern as a result of the patterning. This will cause an increase in the yield of the device. Accordingly, it is necessary to confirm the presence of any defects in a pattern to be transferred onto a substrate by the single-mask exposure process and, if defects are present, make the single-mask exposure process a multistage process and thereby form the pattern by the multistage exposure process. Further, if any defect such as a defect of a photomask occurs during the fabrication of a pattern by the multistage exposure process, it is necessary to carry out a fabrication step for forming a pattern by a multistage exposure process again. 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